METHOD AND DEVICE FOR PRESSURE CONTROL IN LIQUID CONTAINING TANK Russian patent published in 2009 - IPC F17C7/00 

Abstract RU 2358189 C1

FIELD: mechanics.

SUBSTANCE: method includes staged gas supply to a tank at a preset flow rate and control of discharge gas flow rate depending on gas pressure deviation from the preset pressure value. The device for pressure control in tank is provided with an inlet for gas supply and outlet for gas discharge. It also includes unit to correct difference between flow rates at gas inlet and outlet.

EFFECT: precise and smooth pressure control in feed tank.

10 cl, 1 dwg

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RU 2 358 189 C1

Authors

Grjuzon Bertran

Dates

2009-06-10Published

2008-02-19Filed