FIELD: metallurgy.
SUBSTANCE: invention relates to processing of materials, in particular to the devices for application of coatings and is designed for usage in plasma metallurgy, plasma chemistry and machine-building industry. The plasmotron for application of coatings contains the cathode, anode-nozzle, insulator, water cooling system, input channels for the plasma-supporting gas and powder. The input channels for the plasma-supporting gas and powder are united into one channel. The channel is connected with the interelectrode space through the tangential holes of the whirl ring. The total area of the cross sections of the input holes of the whirl ring is equal to the area of the critical cross-section of the anode nozzle. The length of the anode nozzle was selected in the range from 1 to 10 diametres of the critical cross-section of the anode nozzle. The channel between the cathode, insulator, whirl ring and input into the anode nozzle is cone-shaped.
EFFECT: invention is designed to improve effeciency of heating, utilisation factor of the powder at the same time it presents a simplified structure of the plasmotron and improved operational and mechanical-and-physical characteristics of the coatings, better quality of the coatings by strengthening cohesion of the coating with the base.
1 dwg
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Authors
Dates
2009-08-27—Published
2007-12-25—Filed