FIELD: metallurgy.
SUBSTANCE: invention refers to electric apparatus building and to systems of electric power supply, particularly to methods of application of coating on interrupting aluminium contacts of electric commutating devices. The method consists in ion-plasma sputtering of chromium copper on a treated contact at reference voltage on it of 90-120 V and at multiple changes of voltage during sputtering up to 1000-1200 V and back to a reference one and at frequency 1-2 times per each micrometer of sputtered coating thickness. At voltage 1000-1200 V duration of sputtering is 0.2-0.4 from time of coating sputtering of a micron thickness. Chromium copper alloyed with yttrium at amount of 0.2-0.6 wt % is used for sputtering.
EFFECT: increased operation life of aluminium current conducting parts of electric commutating devices.
1 dwg, 2 tbl, 1 ex
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Authors
Dates
2009-09-10—Published
2007-12-24—Filed