METHOD FOR MANUFACTURING OF BASE MATERIAL FOR STENCIL PRINTING AND MATERIAL OF BASE OF THIS TYPE Russian patent published in 2009 - IPC G03F7/12 

FIELD: printing industry.

SUBSTANCE: method is suggested for manufacturing of material for base of stencil printing. According to method, the first resist layer is applied onto one side of protective film, then the first layer of resist is dried, and additional layer of resist is applied into the first layer of resist. After that stencil grid is applied onto additional layer of resist, at the same time side of additional resist layer is moist. Stencil grid is pressed into additional layer of resist under pressure of pressing element, which directly contacts to stencil grid. Besides layer of resist contain additional layer of resist and the first layer of resist.

EFFECT: provision of method for manufacturing of base material, in which openings in material of stencil grid are homogeneously filled with light-sensitive material without losses of light-sensitive material.

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