FIELD: metallurgy.
SUBSTANCE: vacuum device contains vacuum chamber and docked to it open inlet and outlet locking systems of slotted type consisting of slotted channels separated by transfer chambers with piping branch pipes. Maximal rate of pumping out at optimal pressures in transfer chambers is provided ensured by that for version of device implementation with unicameral gateway system of length L distance from inlet into gateway from the side of atmosphere up to transfer chamber is equal to l1=(2/3)L, and distance from transfer chamber up to vacuum chamber is equal to I2=(1/3)L. For version with two-chamber gateway system of length L distance from inlet into gateway from the side of atmosphere up to the first gateway system is equal l1=(4/7)L, distance between the first and the second transfer chamber is equal to l2=(2/7)L, and distance from the second transfer chamber up to vacuum chamber is equal to l3=(1/7)L.
EFFECT: increasing of cost-effectiveness of pumping off process and rate of achievement of specified rate of vacuum in working volume of vacuum chamber.
2 cl, 2 dwg
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Authors
Dates
2010-01-20—Published
2007-12-28—Filed