FIELD: metallurgy.
SUBSTANCE: on surface of rotating graphitic substrate in the form of capsule it is implemented sputtering of silicon dioxide, received by pyrohydrolytic decomposition of silicon tetrachloride at presence of monomolecular water in flame. For formation of laminar boundary layer of flame after contacting to sputtering surface motion path of combustion products during sputtering of capsule casing is directed through aerodynamic channel of reactor. Reactor channel is implemented in the form of longitudinal slot with similar bit slice separation by partitions by height of aerodynamic channel, herewith at sputtering of bottom of capsule flow section of top sections of aerodynamic channel is overlapped.
EFFECT: increasing of amount of deposited on substrate synthesised silicon dioxide with receiving of uniform density of evaporated capsule by its volume and reduction of admixtures.
1 cl, 2 dwg
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