FIELD: chemistry.
SUBSTANCE: method of producing optical quartz glass includes the preparation of a slurry containing a combustible organic solvent and particles of amorphous SiO2 from 2 to 100 g/l, its homogenization for 0.5-1 hour. The homogenized slurry is then continuously fed with a pump into the flame of the oxygen-hydrogen burner to form molten particles of SiO2 at the suspended matter consumption of (8-35)⋅10-3 l/min, oxygen consumption - 20-40 l/min, hydrogen consumption - 40-70 l/min. The flame of the oxygen-hydrogen burner is directed to the surface of the substrate located in the furnace and heated up to 1800-2000°C, thereby depositing the molten particles of SiO2 on the surface of the substrate. The process of depositing particles of SiO2 is stopped after reaching the calculated thickness of the quartz layer, after which the furnace is inertially cooled.
EFFECT: expanding the raw materials base, increasing the transparency in ultraviolet, visible and infrared spectral regions with high transmittance.
4 cl, 2 ex, 1 dwg
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Authors
Dates
2017-10-25—Published
2016-08-04—Filed