METHOD AND DEVICE TO CLEAN GAS FILTER FILTRATION MATERIAL Russian patent published in 2011 - IPC B01D46/02 

FIELD: process engineering.

SUBSTANCE: invention relates to cleaning filtration material of gas filter. Method first stage comprises closing one or several filter segments on the side of discharged cleaned gas. Second stage comprises forcing low-speed cleaning gas flow through filtration material of closed filtration segment (segments) to produce inverse gas flow through filtration material. Third stage comprises generating high-pressure gas pulse (shock wave) to separate contaminating particles, not removed at second stage, from filtration material. For this, pulse valve (e.g. diaphragm valve) is opened for very short time. Fourth stage comprises shutting of inverse gas flow feed. Proposed invention relates also to device intended for closing one or several filtration segments on the side of cleaned gas discharge with the help of movable plate (cover or cap) arranged nearby filtration segment to shut off injection tube, or jointed therewith. One filtration segment 5 or several segments 5 may be detached from the filter.

EFFECT: simple and cheap process, higher safety in dusty conditions.

11 cl, 7 dwg