APPARATUS FOR EXPOSURE WHEN FORMING NANOSIZE STRUCTURES AND METHOD OF FORMING NANOSIZE STRUCTURES Russian patent published in 2011 - IPC G02F1/01 

FIELD: physics.

SUBSTANCE: in an apparatus, having one or more monochromatic radiation sources, a zone accommodating substrates or substrate layers and a plurality of optical elements for forming locally illuminated regions on substrates, said plurality of optical elements is one or more Fabry-Perot interferometers intercrossed by axes of symmetry, the boundaries of light fluxes of which define said zone, wherein said radiation enters the interferometers perpendicular their mirrors. The interference pattern of multibeam interference may include intersection lines of interference maxima in between, while elements lying in said zone and any regions of said zone are transparent.

EFFECT: obtaining nanosize periodic structures on surfaces and in inner regions of solid bodies.

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