METHOD FOR DETERMINING COMPRESSION DEGREE OF SHEARED LAYER AT FORMATION OF CHIP ELEMENT Russian patent published in 2012 - IPC G01N3/58 

Abstract RU 2460986 C1

FIELD: metallurgy.

SUBSTANCE: parameters of sheared layer and ship parameters are determined and compression degree of sheared layer is calculated. The following parameters are measured: height of deformed area of sheared layer, which is used for formation of ship element, and height of the formed chip element; after that, compression degree of sheared layer is calculation by the formula. Parameters are measured in shear speed vector direction after separation of chip element from sheared layer.

EFFECT: higher accuracy of determination of sheared layer compression degree.

2 tbl, 3 dwg

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RU 2 460 986 C1

Authors

Chigodaev Nikolaj Efimovich

Dates

2012-09-10Published

2011-04-01Filed