FIELD: chemistry.
SUBSTANCE: invention relates to methods of purifying lower tetramethoxysilanes, particularly tetramethoxysilane which can be used in microelectronics and in mixtures for fibre-optic glassmaking. The disclosed method of purifying tetramethoxysilane consists of three steps: chemical treatment of the product to be purified with ammonia gas until achieving pH 7.5-8.5, rectification after chemical treatment and distillation with evaporation from the surface without boiling, carried out at rate of 0.1-0.5 g/cm2 h, either before chemical treatment or after rectification. Optimally, the rectification step is carried out on a packed quartz column with efficiency of 30 theoretical separation steps.
EFFECT: obtaining highly pure tetramethoxysilane containing limiting impurities of metals, chlorine and suspended particles with diameter 0,3 mcm.
2 cl, 3 tbl, 3 ex
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