FIELD: chemistry.
SUBSTANCE: invention relates to fine purification of alkylsiloxanes and alkylsilazanes which are used in making light-sensitive resistors and in microelectronics. Disclosed is a purification method comprising three basic steps: fractionation, filtration in liquid and vapour phases on porous polymer filters with pore size 0.1-0.2 mcm and evaporation, followed by condensation in bubble-free conditions at evaporation rate of 0.01-0.2 cm3/h·cm2.
EFFECT: disclosed method enables to obtain highly pure alkylsiloxanes and alkylsilazanes with basic substance content of about 99,99 wt % and content of heterogeneous trace elements less than 10 particles per cm3.
1 cl, 6 ex
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Authors
Dates
2012-04-10—Published
2010-11-08—Filed