METHOD OF PRODUCING TRIETHOXYSILANE Russian patent published in 2013 - IPC C07F7/02 

FIELD: chemistry.

SUBSTANCE: invention relates to methods of producing triethoxysilane which is suitable for producing monosilane for semiconductor engineering and solar power, as well as for various organosilicon liquids and polymers. Disclosed is a method of producing triethoxysilane by directly reacting metallurgical silicon with dry ethyl alcohol in a medium of a high-boiling solvent in the presence of a copper (I) chloride catalyst, where higher efficiency of the process is achieved through two-step activation of the mixture of silicon, solvent and catalyst. At the first step, the mixture is held in a hydrogen current at 180-250°C for 0.5-2.5 hours while stirring. At the second step, the reaction mass is held in the same conditions in an atmosphere of an inert gas without stirring.

EFFECT: disclosed method of activating the reaction mass enables to achieve silicon conversion of more than 75% and triethoxysilane selectivity of over 80%.

1 cl, 7 ex