FIELD: chemistry.
SUBSTANCE: method involves depositing adsorbate vapour onto a substrate in a vacuum and growing a film from monolayers. Deposition is carried out with the lowest possible kinetic energy of adsorbate atoms and with thermal power of the vapour and temperature of the substrate which prevent mixing of adsorbate atoms with substrate atoms and formation of island aggregates of the adsorbate in the film.
EFFECT: preventing mixing of the adsorbate with the substrate and preventing formation of island aggregates of the adsorbate.
7 cl, 17 dwg
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Authors
Dates
2013-06-27—Published
2011-11-17—Filed