GATING OF DUST ACCUMULATING AT DUST TRAP PLANT FOR ROUGH GAS Russian patent published in 2014 - IPC B01D46/42 B65G53/60 C10J3/84 

Abstract RU 2520466 C2

FIELD: process engineering.

SUBSTANCE: accumulated gas gating from gasification process at pressure with the use of gas trap and gate bin should allow getting of nitrogen in rough gas to be minimised or completely ruled out. Note here that subsequent chemical synthesis should be, from the very outset, free of nitrogen admixtures. This method effects this by filter elements arranged in said dust trap and subjected to back purging with gas, other than air, containing gas carbon dioxide or pure carbon dioxide gas. Carbon dioxide containing gas for back purging is used in gating bin for pressure increase and dust loosening.

EFFECT: minimised ingress of nitrogen in rough gas.

8 cl, 1 dwg

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RU 2 520 466 C2

Authors

Shtefan Khamel'

Dates

2014-06-27Published

2010-01-19Filed