METHOD OF FORMING CHARGE MIXTURE FOR GAS MASK FILTER-ABSORPTION ELEMENTS Russian patent published in 2014 - IPC A62B23/02 

Abstract RU 2536218 C1

FIELD: chemistry.

SUBSTANCE: method of forming charge mixture for gas mask filter-absorption elements includes successive formation in layers of a composite charge mixture from layers of activated carbon with a chemically modified surface and a carbon catalyst while maintaining dimensions of the element and providing a wide range of absorption of harmful substances with different physical and chemical properties.

EFFECT: variety reduction of gas mask filter-absorption elements and cleaning inhaled air from a mixture of harmful substances with different physical and chemical properties.

1 dwg, 1 tbl

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RU 2 536 218 C1

Authors

Gavrjushin Sergej Alekseevich

Shaneshkin Vladimir Anatol'Evich

Abaimov Andrej Vladimirovich

Dates

2014-12-20Published

2013-11-26Filed