FIELD: chemistry.
SUBSTANCE: claimed invention relates to composition for processing substrate, which contains: a) active material, which has one or more functional groups, which form covalent attachments to complementary functional groups of substrate in presence of acid or base, with active material being selected from the group, consisting of hydrophilic active materials, hydrophobic active materials and their mixtures; b) photocatalyst, capable of generating acid or base under impact of light, with photocatalyst absorbing light in electromagnetic spectrum from infrared region to visible and ultraviolet light, from 1200 nm to 200 nm; and photocatalyst is represented by photoacid, selected from the group, consisting of aromatic hydroxyl compounds, sulfonated pyrene compounds, onium salts, diazomethane derivatives, bis-sulfone derivatives, disulfide derivatives, nitrobenzyl sulfonate derivatives, derivatives of sulfonic acid esters, N-hydroxyimides of sulfonic acid esters and their combinations; and c) carrier for delivering combination of 1(a) and 1(b) elements; with substrates excluding physiological materials. Claimed invention also relates to method of substrate processing (versions).
EFFECT: creation of composition and elaboration of method for modification of substrate surface, which provide long-term conditioning and protective effect.
14 cl, 9 ex, 6 dwg
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Authors
Dates
2015-01-10—Published
2010-04-28—Filed