METHOD OF PRODUCING SEMICONDUCTOR GRAPHENE Russian patent published in 2015 - IPC H01L21/261 B82B3/00 

Abstract RU 2544266 C2

FIELD: chemistry.

SUBSTANCE: method of producing semiconductor graphene comprises using a graphite workpiece, exposing the entire surface of the workpiece to a stream of slow neutrons, mechanical treatment of the workpiece to separate atomic layers of graphite with a given concentration of the 13C isotope which determines the band-gap.

EFFECT: achieving a specific concentration of the 13C isotope, which enables to open the band-gap by tens of meV.

3 dwg

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RU 2 544 266 C2

Authors

Zhuravleva Ljubov' Mikhajlovna

Plekhanov Vladimir Georgievich

Dates

2015-03-20Published

2013-05-17Filed