PECVD-COATING WITH APPLICATION OF ORGANOSILICON PRECURSOR Russian patent published in 2015 - IPC C23C16/30 A61J1/05 

Abstract RU 2550452 C2

FIELD: chemistry.

SUBSTANCE: invention relates to technology of producing coated vessels for storage of biologically active substances and blood, namely to method of obtaining coating on internal surface of vessel, to coating, obtained on internal surface of vessel, made of polymer compound, glass or melted quartz, and to vessel with said coating for storage of biologically active substances or blood, and can be used for protection of storage of biologically active substances and blood against mechanical and/or chemical impact of vessel surface material without coating. Method includes provision of gaseous reagent, containing organosilicon precursor and optionally O2, near substrate surface and excitation of plasma from said gaseous reagent to provide plasma-enhanced chemical vapour deposition (PECVD) of SiwOxCy up to 1000 nm thick coating, in which w constitutes 1, x constitutes from 0.5 to 2.4 and y constitutes from 0.6 to 3. Atomic ratios are measured by means of X-ray photoelectronic spectroscopy (XPS). Lubricating characteristic of coating, sliding friction force are set by means of ratio of O2 to organosilicon precursor in gaseous reagent and/or by means of value of electric energy, used for plasma excitation.

EFFECT: production of improved vessels with coating, possessing lubricating, hydrophobic or barrier properties is provided.

32 cl, 62 dwg, 21 tbl, 21 ex

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RU 2 550 452 C2

Authors

Fehlts,Dzhon T.

Fisk,Tomas E.

Abrams,Robert S.

Pangborn,Robert Dzh.

Sagona,Piter Dzh.

Dates

2015-05-10Published

2010-05-12Filed