METHOD OF SYNTHESISING NANOCRYSTALLINE SILICON CARBIDE Russian patent published in 2015 - IPC C30B29/36 C01B31/36 B01J19/08 B82B1/00 B82Y30/00 

Abstract RU 2559510 C1

FIELD: chemistry.

SUBSTANCE: method includes the plasmodynamic synthesis of silicon carbide in a hypervelocity jet of an electric discharge plasma, which contains silicon and carbon in a ratio of 3.0:1, generated by a coaxial magnetic-plasma accelerator with graphite electrodes and directed into a closed volume, filled with gaseous argon under normal pressure and a temperature of 20°C, with the temperature of gaseous argon in the closed volume being changed in the range from -20°C to 19°C and from 21°C to 60°C.

EFFECT: regulation of nanocrystalline silicon carbide dispersion.

1 dwg, 1 tbl

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RU 2 559 510 C1

Authors

Sivkov Aleksandr Anatol'Evich

Nikitin Dmitrij Sergeevich

Pak Aleksandr Jakovlevich

Rakhmatullin Il'Jas Aminovich

Dates

2015-08-10Published

2014-04-09Filed