FIELD: chemistry.
SUBSTANCE: invention relates to means of degassing facilities for destruction of chemical weapons destruction (OUHO). Formulation of self-degassing coating contains as film-forming agent urethane-alkyd lacquer and as filler - interpolyelectrolytic complex, which is a reaction product 4.0 wt% solution of cationic polybasic - chitosan in 6.0 wt% aqueous solution of acetic acid to 0.1 wt% aqueous solution of SF-2U powder. Coating provides fast absorption of liquid phase of physiologically active substances (FAS), preventing contamination of safety wear upon contact with contaminated surfaces, thus providing safe operation of OUHO, contaminated not only with FAS of organophosphorus family, but halogenated thioesters.
EFFECT: disclosed is a formulation, during preliminary application on external and internal surface of process rooms of OUHO enables to create a protective layer thereon for ensuring safe operation of facilities.
1 cl, 1 tbl
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Authors
Dates
2016-10-20—Published
2015-01-12—Filed