METHOD FOR SURFACE MODIFICATION OF SILICON OXIDE NANOPARTICLES WITH INCLUDED QUANTUM DOTS Russian patent published in 2017 - IPC C01B33/113 B82B3/00 B82Y10/00 

FIELD: nanotechnology.

SUBSTANCE: present invention relates to nanotechnology and can be used to produce stable aqueous solutions of semiconductor quantum dots coated with a silicon oxide shell, modified with the active group for bioconjugation and stabilized with polyoxyethylene. The method of surface modification of silicon oxide nanoparticles with included quantum dots is disclosed, according to which a microemulsionis prepared comprising a non-polar solvent and surfactant, the quantum dots and tetraethoxysilane are then added and stirred for 24 h, then 3-aminopropyltrimethoxysilane and 2-methoxy(polyethylenoxy) 6-9propyl trimethoxysilane are added and stirred for 24 hours, where hexane is used as a non-polar solvent , Brij L4 is used as the surfactant, wherein deionized water is added to the microemulsion at the following molar ratio of the components: a non-polar solvent: surfactant: deionized water - 9:1:3; the quantum dots are added in an amount of 0.5 nmol per 1 ml of a non-polar solvent, tetraethoxysilane is added in an amount of the order of 105 mol per 1 mol of quantum dots, 3-aminopropyltrimethoxysilane and 2-methoxy(polyethylenoxy)6-9propyl trimethoxysilane are added in an amount of 1/30 mol per 1 mol of tetraethoxysilane.

EFFECT: invention is a method of modifying silicon oxide nanocomposites with quantum dots by sewing PEG and amino groups.

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