FIELD: chemistry.
SUBSTANCE: thin-film layer is applied by method of physical deposition from magnetron discharge plasma of mixed atmosphere of working gases directly onto the surface of coated glass side. As the layer material, an oxygen diffusion barrier for oxygen diffusion is used, comprising a combination of at least two elements selected from group consisting of Ti, Si, Zn, Sn, In, Zr, Al, Cr, Nb, Mo, Hf, Ta and W. The mixed atmosphere of working gases includes the spray component - argon, reaction component - oxygen and the stabilizing component - nitrogen. The mixture pressure of working gases is maintained in the range from 2.2·10-3 Mbar up to 2.8·10-2 Mbar, the specific deposition rate of the protective layer material is maintained in range of 2.4·10-7 up to 4.6·10-6 Nm/(W·s), and partial concentration of the stabilizing constituent of working gases atmosphere is maintained in range from 20% to 40%.
EFFECT: increase of protective properties of thin-film electroconductive optical coatings on glass.
3 cl, 8 dwg, 1 tbl
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Authors
Dates
2017-06-13—Published
2016-01-29—Filed