FIELD: information technology.
SUBSTANCE: method of the process control device monitoring, implemented in the monitoring system of process control device, includes measurement of operating state parameters of the process control device. Relationship of time stamp to the operating state parameters of process control device is implemented in response to the signal based on measurements of possible operating states. Signal indicates an uncontrolled release into the surrounding atmosphere. Time stamp and instructions on monitoring operational states are transmitted. Valve assembly of process control contains a valve for controlling the process; valve position sensor and monitoring system. Valve monitoring system contains a processor, a non-volatile memory storage device and a communication interface for transmitting data from the valve monitoring system.
EFFECT: increasing the accuracy of emission calculation.
24 cl, 5 dwg
