FIELD: manufacturing technology.
SUBSTANCE: invention relates to a method for manufacturing a diffraction grating intended for use in a spectral instrument. Method includes the following steps: finding a pattern of grating strokes in accordance with the law of changing the distance between these strokes found according to the scheme of the spectral instrument. Scheme for recording the found pattern of strokes is calculated. Photoresist is applied to a substrate having a radius of curvature selected with allowance for the dimensions of the spectral device. First and second point sources of coherent radiation and an auxiliary spherical mirror are arranged in the recording apparatus for reflecting the rays from the second point source onto the diffraction grating substrate in accordance with the calculated recording circuit. Pattern of strokes is recorded on the photoresist using the built-in recording unit. Produced by interference lithography relief grating on the substrate with a pattern of strokes recorded on it. Spectral image is obtained by means of a diffraction grating arranged in the spectral instrument and the quality of the obtained spectral image is analyzed, due to which the quality of the diffraction grating is checked and a decision is made about its suitability for use in a spectral instrument.
EFFECT: this method, thanks to the exposure operation in one step, simplifies the production of the diffraction grating.
1 cl, 4 dwg
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Authors
Dates
2018-07-04—Published
2017-07-26—Filed