ELEMENTS TOPOLOGY SYNTHESIS ACCURACY INCREASING METHOD Russian patent published in 2018 - IPC G01B9/00 G01B11/24 

FIELD: optics; electrical equipment.

SUBSTANCE: invention relates to the field of optoelectronics. Elements topology synthesis accuracy increasing method is in using of the circular scanning laser image generator, containing the optical path to ensure the laser radiation delivery to the recording head, optical workpiece with photosensitive material applied; the laser beam focusing on the optical workpiece surface with the photosensitive material applied; use of two additional combined optical sensors, each of which contains the measuring disk with angular and annular rasters, the measuring raster angular displacement sensor and two linear displacement sensors, as well as use of the two-coordinate optical deflector, which is additionally installed in the optical path so that the two-coordinate optical deflector controlled coordinates directions coincide with the focused laser beam radial and angular displacements directions.

EFFECT: technical result consists in reducing of the elements topology formation error value to 10 nm or less, reducing the optical workpiece photosensitive material exposure parasitic modulation value.

1 cl, 1 dwg