METHOD OF OPERATION OF A WELL, COMPLICATED BY CARRYING OUT OF MECHANICAL IMPURITIES Russian patent published in 2019 - IPC E21B43/34 F04B47/00 

FIELD: oil and gas industry.

SUBSTANCE: invention relates to the oil industry and can be used in the operation of oil wells with sucker rod pump installations, complicated by the removal of mechanical impurities. Method comprises the descent on the pump rods sucker rod pump consisting of a cylinder with a plunger, suction and discharge valves, and the rise of reservoir fluid when the plunger moves up due to the lifting of the pump rods by the head of the balance of the pumping unit. Equipment is installed in wells with a production string diameter of at least 114 mm, with a slope relative to the vertical of no more than 30°. Structure consisting of two concentrically arranged outer and inner tubing columns is attached to the bottom of the pump cylinder. Block with a suction valve is attached to the inner column. On the same side, the outer column is attached to the pump cylinder via a coupling. On the opposite side of the outer and inner columns are interconnected so that the liquid can pass into the inner column. Outer tubing string is made with a diameter of at least 73 mm and a length of not more than 10 m, and the internal one with a smaller diameter. Space between the outer and inner columns is a drive. When the pump plunger moves upward, the discharge valve in the plunger closes. At the same time, the suction valve opens. Through the internal column of tubing and open suction valve, the reservoir fluid enters the inside of the pump cylinder and the reservoir. Mechanical impurities are deposited in the accumulator under the action of gravity. When the rocker head moves down, the pump rods push the plunger down. Suction valve closes and the discharge valve opens. Inside the cylinder enters the reservoir fluid, in which there are no large mechanical impurities, settled earlier in the drive.

EFFECT: turnaround time of the well increases, complicated by the removal of mechanical impurities.

1 cl, 1 dwg