PROCESSING DEVICE AND PROCESSING METHOD FOR ETCHING AND PHOSPHATING OF METAL PARTS Russian patent published in 2019 - IPC C23C22/00 C23C22/08 C23C22/73 C23G1/00 C23G1/02 C23G3/00 

FIELD: technological processes.

SUBSTANCE: invention relates to processing device (1) for single-stage etching and phosphating of metal processed article (2). Device comprises treatment tank (4) for receiving article (2) and fluid treatment composition (6), pumping device (10) for circulating at least part of composition (6), filtering device (18) for filtering composition (6) and removing contamination. Device (1) is configured to wash at least part of treated article (2). Reservoir (4) is separated by partition (12) from collecting compartment (14) for collecting composition (6) flowing through partition (12), wherein composition (6) collected in collection compartment (14) by means of supply pipeline (16) is directed back into reservoir (4). Pump device (10) and filtration device (18) form a component part of supply pipeline (16), and supplied treatment composition (6) is passed by pump device (10) through filtration device (18), wherein supply pipeline (16) is made so that treatment composition (6) supplied through it back to treatment tank (4) can create flow mode (20) corresponding to flow through low-pressure dam, to release part of treatment composition (6) from treatment reservoir (4) outside and direct it into collection compartment (14).

EFFECT: invention improves efficiency of single-stage etching and phosphatising of metal processed article and ensures prevention of embrittlement of article.

18 cl, 10 dwg