PLASMA RADIATION SOURCE Russian patent published in 2020 - IPC H05H1/24 

FIELD: plasma technology.

SUBSTANCE: invention relates to plasma engineering and can be used, for example, as a pulsed source of electromagnetic radiation and directed flows of charged particles. Plasma radiation source consists of power supply, two coaxial electrodes, device for gas inlet into plasma compression area, auxiliary and working gases, wherein the auxiliary gas has a greater molar mass than the working gas and is characterized by that it comprises a working gas inlet adjustment system consisting of a discharge initiation delay device and a pumping unit and a gas pressure monitoring device under the working gas valve device valve, wherein the plasma radiation source is configured to initiate the discharge between the electrodes in the auxiliary gas; and by means of working gas supply adjustment system, non-uniform distribution of working gas, which is set through the discharge device, in interelectrode gap of the device is formed.

EFFECT: high efficiency of converting an energy input into the device into the energy of electromagnetic radiation with preservation of spectral characteristics of the radiation of the device.

1 cl, 2 dwg