FIELD: electronic equipment.
SUBSTANCE: use: for processing signals in scanning devices with a highly focused electron beam. Summary of invention consists in the fact that scanning with electron beam of object surface across topological element located on said surface with simultaneous change of controlled parameter value for each scanning line, obtaining a secondary emission signal, converting the signal into digital form, determining the signal contrast value, analyzing the contrast dependence of the controlled parameter, determining from this relationship an one-to-one correspondence between the value of the controlled parameter and the position of the focusing point relative to the object and exposing the focusing point to the required position, wherein the controlled parameter is the potential of the electrode located at the anode of the electro-optical system of the electromagnetic wave.
EFFECT: high accuracy of setting the focusing plane of the electron beam.
1 cl, 1 dwg
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Authors
Dates
2020-02-03—Published
2019-03-20—Filed