FIELD: obtaining electron and ion beams.
SUBSTANCE: invention can be used in engineering for technological purposes, for example, in modification of materials surface. Ion source consists of a glass body, an anode on one side of the body, a cathode with a hole on the other side of the body, a high-voltage power supply, a vacuum and a gas system. Cathode is made in form of ring providing maximum aperture, and is located at the end of cylindrical housing of ion source on side of vacuum chamber, and inside vacuum chamber, and housing is made of dielectric vacuum material.
EFFECT: technical result is higher efficiency of equipment, reliability of operation and uniform distribution of ion flow and neutral particles on area.
4 cl, 1 dwg
Title | Year | Author | Number |
---|---|---|---|
ION GUN | 0 |
|
SU1102474A1 |
GAS-DISCHARGE ELECTRON GUN CONTROLLED BY AN ION SOURCE WITH CLOSED ELECTRON DRIFT | 2022 |
|
RU2792344C1 |
ION GUN | 0 |
|
SU638221A1 |
METHOD SUBSTANCE ION IMPLANTATION | 2017 |
|
RU2666766C1 |
ION BEAM-PUMPED LASER | 0 |
|
SU1143279A1 |
ION GUN | 0 |
|
SU986225A1 |
GAS-DISCHARGE CATHODE-BEAM GUN | 2021 |
|
RU2777038C1 |
ION GUN | 0 |
|
SU1275795A1 |
CATHODE-RAY DEVICE | 1991 |
|
RU2103762C1 |
ION ACCELERATOR FOR LASER PUMPING | 0 |
|
SU1360563A2 |
Authors
Dates
2021-01-11—Published
2019-10-10—Filed