FIELD: vacuum equipment.
SUBSTANCE: invention relates to the field of vacuum equipment, namely to methods and devices for creation of high and ultrahigh vacuum, and can be used, in particular, in technological processes of sputtering of thin films and coatings. In the gas pumping method, comprising stages of electron beam initiation by a group of electrode elements; formation of gas ions in the electron beam channel; interaction of ionized gas and self-negative charge of electron beam; accumulation of ionized gas in electron beam channel under action of electrostatic Coulomb forces; interaction of gas ions inside the electron beam channel with the electromagnetic field of the group of electrode elements designed to initiate the electron beam; extraction of ions from the evacuated area, the current density of the cross section of the electron beam has the form of a function containing at least one strictly local maximum. Ionisation of atoms of the pumped out medium is carried out in the channel of the electron beam; ensemble of ions is retained in the electron beam channel in the form of at least one longitudinal structure. Extraction of ionised gas from the evacuated area is performed by an ionisation source – a group of electrode elements intended for initiation of an electron beam.
EFFECT: higher energy efficiency as compared to existing methods and creation of a system which realizes the method.
19 cl, 18 dwg
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Authors
Dates
2024-10-24—Published
2024-03-22—Filed