DEVICE FOR LIQUID CHEMICAL ETCHING OF SEMICONDUCTOR PRODUCTS Russian patent published in 2021 - IPC H01L21/306 

FIELD: electronics and semiconductors.

SUBSTANCE: invention relates to the field of electronic engineering, namely, devices for chemical processing of semiconductor products. The technical result of the invention is achieved by the fact that in a device for liquid chemical etching of semiconductor products containing an etching chamber, a heater, a thermostat, a thermocouple as a temperature sensor and a display, the etching chamber is placed in a heat-insulating sealed housing equipped with a thermocouple, a heater and a channel for filling a coolant and connected through a built-in solenoid valve with a channel for draining the coolant, the device additionally contains two storage tanks resistant to aggressive media for placing solutions for etching and rinsing, respectively, a vapor-gas suspension condensation system, a holder cassette for semiconductor products equipped with LEDs to indicate the etching level and a channel for removing excess pressure, a microcontroller control system connected to a control panel equipped with a display, two liquid level sensors, a thermocouple, a cassette holder for semiconductor products are placed in the etching chamber, while the etching chamber is connected by a channel with an etching solution storage tank through a solenoid valve, another channel connects it through solenoid valves and pumps with a washing solution storage tank and with a channel for removing used washing solution, a solenoid valve connects it to the channel for draining the etching solution, and also the etching chamber, in addition, is directly connected to the channel for removing the vapor-gas suspension passing through the condensation system, and is also equipped with a sealed transparent door on which the drive for the system for mixing the etching solution is mounted, the above storage tanks to accommodate etching and rinsing solutions, respectively, are equipped with channels for pouring the etching solution and rinsing solution; a thermocouple and a heater are also installed in both storage tanks, while both liquid level sensors, the drive of the etching solution stirring system, all of the above thermocouples, solenoid valves and pumps are connected to the microcontroller control system, and all heaters are connected to the microcontroller control system through thermostats.

EFFECT: said invention is aimed at ensuring stability of the parameters of the etching process mode: temperature and concentration of the etching solution, as well as increasing the degree of automation of the chemical etching process, which is necessary to improve quality and yield of suitable products.

1 cl, 1 dwg