METHOD FOR DETERMINING WAVE ABERRATIONS OF OPTICAL SYSTEM Russian patent published in 2021 - IPC G01M11/02 

FIELD: optical instrumentation.

SUBSTANCE: invention relates to the field of optical instrumentation and concerns a method for determining wave aberrations of an optical system. When implementing the method, a light beam with a wavelength L is directed to the optical system and the distribution of the intensity of the light beam in various planes in the image space is measured. The position of the P_max plane is determined, in which the peak intensity has the maximum value of I_max, and also the contour of the isophote in the distribution of the intensity of the light beam in the P_max plane at the level of 0.2⋅I_max and the distance R of the maximum distance of the point with the intensity of I_max from the contour of the isophote. The distance L_max from the plane P_max to the plane P in contact with the last surface of the optical system is measured. Next, the distribution of the intensity of the light beam is measured in the coordinates of two planes P_1reg and P_2reg, located from the plane P at distances determined depending on the values L, R and L_max. According to the obtained data, the wave aberrations of the optical system w₁(x,y) and w₂(x,y) are determined in the coordinates of the plane P. The values of the wave aberrations w(x,y) of the optical system are determined as w(x,y)=[w₁(x,y)+w₂(x,y)]/2.

EFFECT: increased accuracy and reliability of determining wave aberrations.

1 cl, 4 dwg, 4 tbl