FIELD: measuring equipment.
SUBSTANCE: method for monitoring the resistance of contact pairs of mobile contact apparatus (MCA) relates to instrumentation and measuring equipment, in particular, to methods for monitoring minor resistances. The substance of the invention consists in the fact that in the process of monitoring the resistance of a contact pair of a multi-channel MCA, the flow of current thereby is provided by means of a second contact pair, and the voltage drop on the monitored contact pair is measured by means of a third contact pair. The values of resistance of the contact pair are calculated based on the measurement results in various positions of the mobile part of the object relative to the stationary part thereof, and the CP resistance profile recorded in the process of moving the MCA is compared with the calculated CP profile, and the quality of the CP is assessed based on the comparison results. Each contact pair of the mobile contact apparatus is monitored applying any two other contact pairs of the same mobile contact apparatus.
EFFECT: simplified process of monitoring and increase in the accuracy of monitoring results.
1 cl, 15 dwg
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Authors
Dates
2022-06-30—Published
2021-06-21—Filed