FIELD: chemistry.
SUBSTANCE: invention relates to a perfluoroalkadiene composition suitable for producing etching gases, coolants, heat-conducting media, foaming agents, and resin monomers. Composition contains a perfluoroalkadiene compound represented by formula (1), wherein n constitutes an integer from 4 to 20; a compound represented by formula (3), wherein n has values as defined above and X3 stands for a halogen atom; a compound represented by formula (4A), wherein n has values as defined above, X1 and X2 are the same or different and stand for a halogen atom, provided that X1 and X2 are not simultaneously a fluorine atom; and/or a compound represented by formula (4B), wherein n has values as defined above, X2 and X3 are the same or different and stand for a halogen atom; and a compound represented by formula (5), wherein n has values as defined above, X1, X2, and X3 are the same or different and stand for a halogen atom, provided that X1 and X2 are not simultaneously a fluorine atom, wherein the compound represented by formula (1) is contained in an amount from 80 to 99.8% mol., and the compound represented by formula (5) is contained in an amount from 0.05 to 1% mol., as calculated for the total amount of perfluoroalkadiene composition taken as 100% mol. Invention also relates to an etching gas, a coolant, a heat transfer medium, a foaming agent, and a resin monomer.
EFFECT: proposed method provides the possibility of synthesising the target compound with a higher yield with lesser production of hard-to-isolate inclusions.
CF2=CF-(CF2)n-4-CF=CF2 (1)
CF2=CF-(CF2)n-4-CFX3-CF2H (3)
CF2X1-CFX2-(CF2)n-4-CF=CF2 (4A)
CF2H-CFX2-(CF2)n-4-CFX3-CF2H (4B)
CF2X1-CFX2-(CF2)n-4-CFX3-CF2H (5)
7 cl, 3 tbl, 8 ex
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Authors
Dates
2022-12-30—Published
2019-06-14—Filed