METHOD FOR GENERATING A PULSE BEAM OF LIGHT IONS Russian patent published in 2023 - IPC H05H15/00 

FIELD: ion beams.

SUBSTANCE: invention relates to a method for generating a pulsed beam of light ions and can be used for technologies for radiation-beam modification of products, as well as for initiating nuclear reactions. The method includes the supply of dual bipolar nanosecond voltage pulses to the potential electrode of the ion diode. During the first negative pulse, a coating is formed on the surface of the potential electrode from compounds of atoms of the material of the potential electrode with atoms of the actuation gas at a pressure in the ion diode chamber of 2-80 MPa. During the second positive pulse, ions are emitted from the explosive-emission plasma formed on the surface of the potential electrode, which are accelerated in the interelectrode gap and directed to the area of transportation of the pulsed beam of light ions through slots in the grounded strip electrode. Moreover, the material of the potential electrode is selected based on: λ_D < 0.15 (d₁-d₂), where λ_D is the distance at which the electric field strength in the explosive emission plasma decreases by a factor of 2.7 (Debye radius); d₁ is the thickness of the light ionic component layer at the emission boundary of the explosive emission plasma; d₂ is the thickness of the layer of the heavy ion component at the emission boundary of the explosive emission plasma.

EFFECT: reduced concentration of impurity ions and simplified change in the composition of the ion beam.

2 cl, 12 dwg