METHOD OF DENTAL IMPLANT MANUFACTURING Russian patent published in 2023 - IPC A61C8/00 A61K6/00 

FIELD: medical technology, dentistry and traumatology.

SUBSTANCE: invention can be used in the development of dental implants. A method of manufacturing a dental implant including obtaining an implant workpiece by milling a titanium rod, cleaning is carried out by placing the implant workpiece on special holders in the chamber of a sputtering installation and evacuation, the surface is cleaned by the plasma method, the first layer of graphene is applied, consisting of a compound of titanium with carbon and calcium hydroxyapatite, with simultaneous arc sputtering of a titanium cathode and pulsed arc sputtering of calcium hydroxyapatite and a graphite cathode, the second graphene layer of carbon nanocoating is applied by means of pulsed arc sputtering of a graphite cathode under conditions of condensation of a diamond-like film, sterilization is carried out by irradiation with radioactive gamma radiation. Before placing the implant workpiece in the chamber of the spraying installation for its subsequent cleaning by the plasma method in vacuum, cleaning of the implant workpiece from contaminants in trichloroacetic acid CCl₃COOH and hydrochloric acid HCl by supplying water vapor and perchlorethylene C₂C_l4 at a temperature of 121 to 151 degrees Celsius in a ratio of 1:1 is carried out, after cleaning in acids, the implant workpiece is sandblasted with a mixture of particles of aluminum oxide and graphene in a ratio of 9:1 for 10 minutes until macroroughness with micropits of 2–4 microns appear, then the surface of the implant is cleaned of aluminum oxide residues by an aqueous solution with a temperature of 40 to 50 degrees Celsius containing 190.0–200.0 g/l of sulfuric acid H2SO4, 50.0 g/l of ammonium persulfate (NH4)2S2O8 and 5 g/l of tellurium dioxide TeO for 10–15 minutes.

EFFECT: invention provides improvement of biocompatibility and antibacterial properties of the implant.

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