METHOD FOR MARKING RELIEF PRECURSOR TO OBTAINING RELIEF STRUCTURE Russian patent published in 2023 - IPC B41C1/05 B41N1/12 G03F7/20 

Abstract RU 2809727 C2

FIELD: data storage.

SUBSTANCE: method for marking a relief precursor or a relief containing a carrier and a relief-forming layer has the steps of: a) providing a relief precursor containing a carrier and a relief-forming layer; wherein the relief-forming layer is a photopolymerizable layer onto which a masking layer suitable for creating an image is applied; b) providing data that marks the type of relief or relief precursor and contains process-related parameters for processing it, in form of at least one two-dimensional code; c) introducing at least one two-dimensional code as a relief into the relief-forming layer. Stage c) includes the following stages: ca) writing a two-dimensional code into the masking layer by creating an image in the masking layer, cb) exposing the photopolymerizable relief-forming layer to electromagnetic radiation through the image in the masking layer; cc) removing the remnants of the masking layer and unexposed parts of the photopolymerizable relief-forming layer to obtain a relief. After step ca) the data contained in the code is read to control at least one of steps cb) and cc).

EFFECT: long-term data encoding, reading and application for process control are provided.

13 cl

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RU 2 809 727 C2

Authors

Muehlfeit, Markus

Bickert, Timo

Lennick, Ruediger

Knapp, Andrew

Dates

2023-12-15Published

2018-12-07Filed