FIELD: physics.
SUBSTANCE: proposed invention describes the method of producing a resistive matrix furnished with at least two areas with different images thereon. The said method uses at least two photoresistor matching the images being generated. Note here that diffraction structures are made or written in the layer of the first and/or second photoresistor by means of exposure.
EFFECT: simpler exposure of resistors of resistors by means of various-type radiations to allow resistor layer thickness on various sites to match exposure parameters, if required.
37 cl, 48 dwg
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