FIELD: various technological processes.
SUBSTANCE: invention relates to the technical field of producing semiconductors, in particular to an ash collection system in industrial production, such as obtaining monocrystalline silicon, polycrystalline silicon and monocrystals of silicon with a high level of doping. System comprises ash discharge device, ash transportation pipeline and ash collection tank. At that, the ash discharge device comprises a shell, in which a first air outlet, a first air inlet and an ash removal hole are formed, wherein said shell accommodates first clean air chamber and first dirty air chamber. Also, in the first chamber for clean air there is a plurality of first filtering structures and vibration structures, wherein vibration structures are made with possibility of excitation of vibration of first filtering structures, first chamber for dirty air is equipped with sweeping structure, and sweeping structure is made with possibility to sweep ash filtered by the first filtering structures to ash removal hole. In addition, the ash collection tank comprises a cylindrical shell and an ash bin, wherein a second air inlet and a second air outlet are formed in the cylindrical shell, the ash removal hole communicates with the second air inlet through the ash transportation pipeline, the second clean air chamber and the second dirty air chamber are located in the cylindrical shell. Second filtering structures are located in the second dirty air chamber, ash bin communicates with the second dirty air chamber, ash collection structure is located in the ash bin, wherein ash collection structure is configured to collect ash.
EFFECT: creation of ash collection system, which provides efficiency of manual cleaning of ash bin and reduction of secondary contamination.
10 cl, 8 dwg
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Authors
Dates
2024-05-02—Published
2023-08-31—Filed