FIELD: various technological processes.
SUBSTANCE: invention relates to a method for gas-thermal sputtering of a coating on a body of revolution with a spherical surface. Sputtering is performed with movement of plasmatron along generatrix of body of revolution and rotation of plasmatron around axis passing through centre of sputtered spherical surface perpendicular to spherical surface. Then, additional sputtering is carried out with inclination of longitudinal axis of plasmatron at angle of 20–30 degrees to generatrix of spherical surface.
EFFECT: providing a coating with porosity of 30–50%, having a uniform thickness.
1 cl, 2 dwg, 5 ex
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