METHOD OF PLASMA SPUTTERING WITH PLASMATRON ATTACHMENT AND DEVICE FOR ITS IMPLEMENTATION Russian patent published in 2019 - IPC C23C4/00 

FIELD: metallurgy.

SUBSTANCE: invention relates to metallurgy, to sputtering of plasma coatings and can be used for formation of wear-resistant, corrosion-resistant and functional coatings with minimum content of oxides formed during sputtering. Method and device for sputtering of coatings using nozzle to plasmatron with extraction of plasma-forming gas after heating and acceleration of sputtered particles. Method involves attaching a chamber with a protective atmosphere to the plasmatron nozzle and returning the plasma-forming gas to the nozzle outlet end, sputtering and additional supply of pure inert gas. Plasma spraying device with a plasmatron attachment includes a nozzle for acceleration and heating of particles of the sputtered material, an annular channel for plasma jet gas extraction, a cooler, a compressor with a filter, nozzles for supply of returned gas to the spraying zone and supply of pure inert gas, and a chamber with a protective atmosphere attached to the end of the nozzle.

EFFECT: reduced content of oxygen in sprayed coating.

7 cl, 1 tbl, 7 ex, 4 dwg