DEVICE FOR RECORDING X-RAY DIFFRACTION PARAMETERS OF CRYSTAL WHEN EXPOSED TO LASER RADIATION Russian patent published in 2024 - IPC G01N23/20 G01N25/00 

FIELD: measuring.

SUBSTANCE: invention can be used for registration of X-ray diffraction parameters of a crystal when exposed to laser radiation. Essence of the invention consists in the fact that a device for recording X-ray diffraction parameters of a crystal when exposed to laser radiation comprises an X-ray source, a diaphragm, a sample mounted on a goniometric system, a laser radiation source and a control computer connected to the motors of the goniometer, wherein between the diaphragm and the sample mounted on the goniometric system there is an asymmetrically cut crystal monochromator, and a two-dimensional detector is installed behind the sample along the path of reflected beams, which is connected to a control computer.

EFFECT: high accuracy and reliability of crystal analysis results.

1 cl, 4 dwg