ABRASIVE POLISHING SUSPENSION FOR MICROWAVE ELECTRONIC EQUIPMENT MATERIALS Russian patent published in 2025 - IPC C09G1/02 C09G1/14 C01B32/25 C07C31/22 

FIELD: chemistry.

SUBSTANCE: invention relates to production of abrasive polishing suspensions for materials of microwave electronic equipment. Polishing suspension consists of submicron diamond powder 0.1-0.2 wt.%, glycerine 23.0-25.0 wt.% and deionised water – the rest. Particle size of the diamond powder is less than 0.5 mcm. Deionised water is used with purity of not less than 99.9% and specific resistance of not less than 18 MOhm⋅cm.

EFFECT: invention makes it possible to improve the quality of surface treatment of materials for microwave electronic equipment.

2 cl, 3 dwg, 1 tbl, 6 ex