FIELD: chemistry.
SUBSTANCE: invention relates to production of abrasive polishing suspensions for materials of microwave electronic equipment. Polishing suspension consists of submicron diamond powder 0.1-0.2 wt.%, glycerine 23.0-25.0 wt.% and deionised water – the rest. Particle size of the diamond powder is less than 0.5 mcm. Deionised water is used with purity of not less than 99.9% and specific resistance of not less than 18 MOhm⋅cm.
EFFECT: invention makes it possible to improve the quality of surface treatment of materials for microwave electronic equipment.
2 cl, 3 dwg, 1 tbl, 6 ex
Title | Year | Author | Number |
---|---|---|---|
SUPERFINISH POLISHING DIAMOND PASTE | 1999 |
|
RU2174138C2 |
ABRASIVE SUSPENSION | 1989 |
|
RU2102543C1 |
POLISH COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING | 1993 |
|
RU2082738C1 |
DETERGENT-POLISHING AGENT | 2003 |
|
RU2256682C1 |
METHOD OF ABRASIVE TREATMENT OF METAL OPTICAL MIRRORS | 2002 |
|
RU2223850C1 |
POLISHING COMPOSITION | 0 |
|
SU1578169A1 |
0 |
|
SU1781271A1 | |
COMPOSITION OF MAGNETORHEOLOGICAL SUSPENSION FOR FINISHING OPTICAL ELEMENTS BASED ON WATER-SOLUBLE CRYSTALS | 2023 |
|
RU2808226C1 |
COMPOSITIONAL FERROABRASIVE POWDER AND METHOD FOR OBTAINING SAME | 2007 |
|
RU2366676C2 |
PASTE FOR POLISHING MATERIALS | 2015 |
|
RU2615408C2 |
Authors
Dates
2025-04-29—Published
2024-12-03—Filed