FIELD: abrasive materials. SUBSTANCE: abrasive suspension for polishing semiconductive materials has the following components, wt.-%: acid sodium fluoride, 1-5; diamond micropowder, 1-3; and distilled water, the balance. Invention is used for high-energetic laser systems. EFFECT: improved quality of optical surface. 1 tbl, 2 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| COMPOSITION OF MAGNETORHEOLOGICAL SUSPENSION FOR FINISHING OPTICAL ELEMENTS BASED ON WATER-SOLUBLE CRYSTALS | 2023 |
|
RU2808226C1 |
| POLISH COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING | 1993 |
|
RU2082738C1 |
| METHOD OF ABRASIVE TREATMENT OF METAL OPTICAL MIRRORS | 2002 |
|
RU2223850C1 |
| METHOD OF POLISHING SEMICONDUCTOR MATERIALS | 2011 |
|
RU2457574C1 |
| COMPOSITION FOR ASSOCIATED POLISHING TOOL | 2013 |
|
RU2526982C1 |
| DIAMOND-ABRASIVE COMPOSITION FOR POLISHING BORATE GLASS | 0 |
|
SU563006A1 |
| COMPOUND FOR POLISHING METAL SURFACES | 0 |
|
SU1787163A3 |
| POLISHING SUSPENSION AND METHOD OF CERAMIC PART POLISHING | 2006 |
|
RU2354675C1 |
| METHOD OF FINISH MACHINING | 2006 |
|
RU2336984C2 |
| POLISHING PASTE | 1991 |
|
RU2034888C1 |
