AQUEOUS ETCHING COMPOSITIONS AND USE THEREOF Russian patent published in 2025 - IPC C23C22/73 C23F11/167 C23G1/24 C23G1/26 C23C22/18 C23C22/83 

Abstract RU 2840744 C1

FIELD: chemistry.

SUBSTANCE: group of inventions relates to an aqueous composition for etching a metal base, methods for etching a metal base and applying a coating on a metal base. Aqueous composition for etching a metal base has a pH value at temperature of 55 °C in range of 5–9 and contains at least two different derivatives of aminoorganophosphonic acid of formula (I)

in which residues R independently represent CH2-PO(OR'')2, residues R' independently represent alkylene residues with 2–4 carbon atoms, residues R'' independently represent H, Na, K, Li or NH4 and n is integer from 0 to 4, and wherein at least two different derivatives of aminoorganophosphonic acid differ by value of n.

EFFECT: invention provides balanced etching of different metal substrates without breaking adhesion of subsequent coating layers.

18 cl, 8 tbl

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RU 2 840 744 C1

Authors

Mohr Anna Verena

Six Marcell

Khelfallah Nawel Souad

Dates

2025-05-28Published

2021-06-04Filed