ELECTRON ACCELERATOR Russian patent published in 1994 - IPC

FIELD: generation of pulse electron beams. SUBSTANCE: cathode holder 7 forms, together with accelerator case 10, vacuum line that functions as inductive storage iunit. Dielectric plate 12 is fitted between metal plates 11 on case 10. Plate 12 and cathode holder 7 form additional diode gap 13. Plasma is formed on surface of dielectric plate 12 as result of surface breakdown. At the moment of arrival of second negative-voltage pulse diode gap 13 is shorted out. As soon as current rises to definite value, plasma starts dispersing and plasma-free layer is formed in diode gap 13. In choosing thickness of dielectric plate 12, current supplied by double-pulse generator, when diode gap 13 is shorted out, should be higher than Ybr. Formed layer thickness increases with time, impedance of diode gap 13 also rises and becomes comparable with impedance of diode 6, that is, generator current is partially switched over to diode 6. So, diode gap 13 functions as plasma isolator. EFFECT: simplified design and improved accelerator power. 1 dwg