FIELD: generation of intensive ion beams. SUBSTANCE: ion source has equipotential hollow cathode, ring anode, magnetic system, multiaperture extraction system and additional cavity. Working gas is bled into ion source through additional cavity. Evacuation occurs through multiaperture extraction system. Pressure in additional cavity located below equipotential cathode is by a factor higher than in hollow cathode. Thanks to high pressure (10-1 Torr) in additional cavity main discharge burns between anode and additional cavity with low burning voltage. Main generation of ions takes place in part close to anode. Ions are extracted from hollow cathode through multiaperture extraction system. EFFECT: prolonged service life, increased electric efficiency of ion source based on discharge with cold cathode concentrated in crossed electric and magnetic fields. 1 dwg
Title | Year | Author | Number |
---|---|---|---|
ION SOURCE | 1989 |
|
SU1769630A2 |
ION SOURCE | 0 |
|
SU854192A1 |
SOURCE OF IONS OF VAPORS OF METALS | 1990 |
|
RU1745080C |
SOURCE OF IONS OF GASES | 1988 |
|
SU1625254A3 |
ION SOURCE | 0 |
|
SU1145383A1 |
PLASMA BEAM S H F DEVICE | 1986 |
|
RU2084985C1 |
ION SOURCE | 1990 |
|
RU1766201C |
SOURCE OF IONS OF METALS | 1986 |
|
SU1371434A1 |
SOURCE OF CHARGED PARTICLES | 1989 |
|
SU1616412A3 |
SOURCE OF IONS | 1976 |
|
SU581741A3 |
Authors
Dates
1995-04-10—Published
1985-12-24—Filed