METHOD OF DETERMINATION OF PROFILE OF CONCENTRATION OF DOPING IMPURITY IN SEMICONDUCTOR Russian patent published in 1995 - IPC

Abstract SU 1499634 A1

FIELD: nondestructive investigation methods of materials. SUBSTANCE: high-frequency harmonic current signal and constant voltage are applied in compliance with method to contact of semiconductor with metal or electrolyte and amplitude of demodulated low-frequency voltage signal which is inversely proportional to value of concentration of impurity in sample is measured. Thanks to great separation of low-frequency and high-frequency signals task of extraction of weak low-frequency signal of nonlinear response carrying information on concentration is considerably facilitated. EFFECT: increased precision and resolving power of measurement of profile, provision for capability of investigation of high-resistance semiconductors and simplification of method. 3 dwg

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SU 1 499 634 A1

Authors

Abaturov M.A.

Elkin V.V.

Krotova M.D.

Mishuk V.Ja.

Pleskov Ju.V.

Sakharova A.Ja.

Dates

1995-07-20Published

1987-06-01Filed